Technology meets fashion this evening, as Epson’s digital couture presentation returns to NYFW. Their third annual project event takes place on this Tuesday, February 7th, 2017 at the IAC Building, and will present the work of 13 design teams from North and Latin America. Epson’s incredible textile printing solutions allow for a unique presentation, including endless possibilities utilizing advanced digital imaging design technology.
Innovative designers took advantage of these incredible digital dye-sublimation and direct-to-garment techniques. They are Alexandra Polo and Miguel Moyano from Ecuador, Carlos de Moya from The Dominican Republic, Daniel Barreria from Brazil, Daniela Hoehmann from Chile, Leonardo Mena from Mexico, Ricardo Pava from Colombia, Sarah Stevenson from Canada, Sonia Chang and Daniel del Barco from Costa Rica, Susan Wagner from Peru, Venesa Krongold from Argentina, and Lindsay Degen and Sarah Richards from the U.S.
